Boron trifluoride
Molecular formula: BF3
Molecular weight: 67.80
GAS number: 7637-07-2
Melting point: -127 ℃
Boiling point: -100 ℃
Flash point: 4 ℃
Water solubility: soluble in water
Main applications: Boron trifluoride can be used as a semiconductor material, high-energy rocket fuel, organic synthesis catalyst, boron isotope separation raw material, chemical synthesis raw material, metal alloy antioxidant, epoxy resin curing agent, etc. High purity boron trifluoride can be applied in the semiconductor industry, including doping, ion implantation, oxidation diffusion, plasma etching, and silicon/germanium epitaxial growth. Doping is one of the important application fields of boron trifluoride, which is a commonly used boron doping product that can enhance the electrical properties of silicon wafers. It is mainly used in the production of P-type semiconductors.
Molecular weight: 67.80
GAS number: 7637-07-2
Melting point: -127 ℃
Boiling point: -100 ℃
Flash point: 4 ℃
Water solubility: soluble in water
Main applications: Boron trifluoride can be used as a semiconductor material, high-energy rocket fuel, organic synthesis catalyst, boron isotope separation raw material, chemical synthesis raw material, metal alloy antioxidant, epoxy resin curing agent, etc. High purity boron trifluoride can be applied in the semiconductor industry, including doping, ion implantation, oxidation diffusion, plasma etching, and silicon/germanium epitaxial growth. Doping is one of the important application fields of boron trifluoride, which is a commonly used boron doping product that can enhance the electrical properties of silicon wafers. It is mainly used in the production of P-type semiconductors.
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